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Optics-free, plasma-based lithography in inorganic resists made up of nanoparticles

TitleOptics-free, plasma-based lithography in inorganic resists made up of nanoparticles
Publication TypeJournal Article
Year of Publication2016
AuthorsShaw, S, Miller, KJ, Colaux, JL, Cademartiri, L
JournalJournal of Micro-Nanolithography Mems and Moems
Date Published07
Type of ArticleArticle
ISBN Number1932-5150
Accession NumberWOS:000388219500007
Keywordscolloidal nanocrystals, colloids nanoparticles, Engineering, films, inorganic photoresists, low-cost and rapid, Materials Science, optics, optics-free lithography, plasma, self-assembly, Technology - Other Topics

We describe a lithographic approach-nanocrystal plasma polymerization-based lithography-in which colloidal nanocrystal assemblies (CNAs) are used as the inorganic resist and, potentially, the active material. The patterning process is based on a change in the dispersibility of the CNAs in solvents as a result of the exposure to plasmas. Plasmas can etch the capping ligands from the exposed area. During the development step, the unexposed area of CNAs is redispersed, leaving behind the patterned area, similar to what is expected from negative photoresist. (C) 2016 Society of Photo-Optical Instrumentation Engineers (SPIE)

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Short TitleJ. Micro-Nanolithogr. MEMS MOEMS
Alternate JournalJ. Micro-Nanolithogr. MEMS MOEMS