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Optics-free lithography on colloidal nanocrystal assemblies

TitleOptics-free lithography on colloidal nanocrystal assemblies
Publication TypeBook Chapter
Year of Publication2016
AuthorsShaw, S, Miller, KJ, Colaux, JL, Cademartiri, L
EditorHohle, CK, Younkin, TR
Book TitleAdvances in Patterning Materials and Processes XXXIII
Series TitleProceedings of SPIE
Volume9779
Pagination97791j
PublisherSPIE-Int Soc Optical Engineering
CityBellingham
ISBN Number978-1-5106-0014-0
Accession NumberWOS:000377659400041
Keywordscolloids, films, lithography, nanocrystal, nanoparticles, optics-free, plasma, plasma polymerization, self-assembly
Abstract

We describe a lithographic approach - Nanocrystal Plasma Polymerization (NPP)-based lithography (Figure 1) - where colloidal nanocrystal assemblies (CNAs) are used as the resist and, potentially, the active material. The patterning process is based on a change in the dispersibility of the CNAs in solvents as a result of the exposure to plasmas. Plasmas can etch the capping ligands from the exposed area. During the development step, the unexposed area of CNAs are redispersed leaving behind the patterned area.

DOI10.1117/12.2218792
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