|Title||Large-Scale Synthesis of Colloidal Si Nanocrystals and Their Helium Plasma Processing into Spin-On, Carbon-Free Nanocrystalline Si Films|
|Publication Type||Journal Article|
|Year of Publication||2018|
|Authors||Mohapatra, P, Mendivelso-Perez, D, Bobbitt, JM, Shaw, S, Yuan, B, Tian, XC, Smith, EA, Cademartiri, L|
|Type of Article||Article|
|Keywords||amorphous-silicon monoxide, arrays, building-materials, carbon free, colloidal nanoparticle, confinement, dots, evolution, helium plasma, large-scale synthesis, laser-ablation, Materials Science, nanocrystalline Si film, nanoparticles, photoluminescence, quantum, Technology - Other Topics, thin-films|
This paper describes a simple approach to the large-scale synthesis of colloidal Si nanocrystals and their processing into spin-on carbon-free nanocrystalline Si films. The synthesized silicon nanoparticles are capped with decene, dispersed in hexane, and deposited on silicon substrates. The deposited films are exposed to nonoxidizing room-temperature He plasma to remove the organic ligands without adversely affecting the silicon nanoparticles to form crack-free thin films. We further show that the reactive ion etching rate in these films is 1.87 times faster than that for single-crystalline Si, consistent with a simple geometric argument that accounts for the nanoscale roughness caused by the nanoparticle shape.
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