Metal-nanowall grating transparent electrodes: Achieving high optical transmittance at high incident angles with minimal diffraction

TitleMetal-nanowall grating transparent electrodes: Achieving high optical transmittance at high incident angles with minimal diffraction
Publication TypeJournal Article
Year of Publication2013
AuthorsKuang P, Park JM, Liu GY, Ye Z, Leung W, Chaudhary S, Lynch D, Ho KM, Constant K
Journal TitleOptics Express
Volume21
Pages2393-2401
Date Published01/28
Type of ArticleArticle
ISBN Number1094-4087
Accession NumberWOS:000315989500102
Keywordsconducting oxides, films, LIGHT-EMITTING-DIODES, organic solar-cells
Abstract

A novel architecture has been employed to fabricate transparent electrodes with high conductivity and high optical transmittance at high incident angles. Soft lithography is used to fabricate polymer grating patterns onto which thin metallic films are deposited. Etching removes excess metal leaving tall walls of metal. Polymer encapsulation of the structure both protects the metal and minimizes diffraction. Transmission is dependent upon the height of the walls and encapsulation and varies from 60% to 80% for structures with heights of 1400 nm to 300 nm. In encapsulated structures, very little distortion is visible (either parallel to or perpendicular to standing walls) even at viewing angles 60 degrees from the normal. Diffraction is at characterized through measurement of intensity for zeroth through third order diffraction spots. Encapsulation is shown to significantly reduce diffraction. Measurements are supported by optical simulations. (C) 2012 Optical Society of America

URL<Go to ISI>://WOS:000315989500102
DOI10.1364/OE.21.002393