Fabrication of submicron metallic grids with interference and phase-mask holography

TitleFabrication of submicron metallic grids with interference and phase-mask holography
Publication TypeJournal Article
Year of Publication2011
AuthorsPark JM, Kim TG, Constant K, Ho KM
Journal TitleJournal of Micro-Nanolithography Mems and Moems
Volume10
Pages013011
Date Published01
ISBN Number1932-5150
Accession NumberISI:000288944900020
Keywordscomplex nanostructures, e, fabrication and characterization nanoscale materials, holographic interferometry, LITHOGRAPHY, methods of micro- and nanofabrication, microstructures, photonic bandgap materials, SUBWAVELENGTH HOLE ARRAYS, symmetry, transmission
Abstract

Complex, submicron Cu metallic mesh nanostructures are made by electrochemical deposition using polymer templates made from photoresist. The polymer templates are fabricated with photoresist using two- beam interference holography and phase mask holography with three diffracted beams. Freestanding metallic mesh structures are made in two separate electrodepositions with perpendicular photoresist grating templates. Cu mesh square nanostructures having large (52.6%) open areas are also made by single electrodeposition with a photoresist template made with a phase mask. These structures have potential as electrodes in photonic devices. (C) 2011 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI: 10.1117/1.3541794]

URL<Go to ISI>://000288944900020
DOI10.1117/1.3541794
Alternate JournalJ Micro-Nanolith MemJ Micro-Nanolith Mem