Vacancy defects in aluminum formed during aqueous dissolution

TitleVacancy defects in aluminum formed during aqueous dissolution
Publication TypeJournal Article
Year of Publication2011
AuthorsHebert KR, Ai JH, Stafford GR, Ho KM, Wang CZ
Journal TitleElectrochimica Acta
Volume56
Pages1806-1809
Date Published01
Type of ArticleProceedings Paper
ISBN Number0013-4686
Accession NumberISI:000287951600016
Keywords(111)-textured, alkaline-solutions, aluminum, au, corrosion, diffusion, EQUILIBRIUM, evolution, HYDRIDE, hydrogen, hydrogen absorption, in-situ stress, Stress measurement, Vacancies, weber thin-films
Abstract

Aqueous dissolution of aluminum is accompanied by extensive absorption of hydrogen, along with formation of hydride and voids. We used in situ stress measurements to discriminate between absorption mechanisms leading to either interstitial or vacancy defects, and to relate defect formation to surface chemistry. Large tensile shifts of the stress-thickness product, approaching 35 N/m, were found during the initial exposure of Al thin films to aqueous NaOH solutions at pH 12-13. The time dependence of the stress-thickness product correlated with mass of metal dissolved, as determined with the quartz crystal microbalance. The observed relationship between stress and mass change was consistent with a significant fraction of dissolved Al atoms forming vacancies or vacancy-hydrogen defects. Electrochemical potential transients indicated that the onset of the tensile stress change corresponds to the presence of aluminum hydride at the metal surface. We propose mechanisms in which vacancy-hydrogen defects form either due to hydride, or because of the elevated hydrogen chemical potential at the Al surface. (C) 2010 Elsevier Ltd. All rights reserved.

URL<Go to ISI>://000287951600016
DOI10.1016/j.electacta.2010.08.052
Alternate JournalElectrochim. Acta